| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1623 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2011-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d997dc988ce82f466ff093df839cfdad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e96838a15a68d1b16e1d12775f6f0146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a76e8605131abd5f02bb0e161a1e6b55 |
| publicationDate |
2014-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
RU-2533490-C1 |
| titleOfInvention |
Light-sensitive negative polymer composition |
| abstract |
FIELD: physics. n SUBSTANCE: disclosed is a light-sensitive negative polymer composition comprising (a) an epoxy group-containing compound, (b) a first onium salt containing a structure of a cationic part of formula (b1) , and a structure of an anionic part of formula (b2) , and (c) a second onium salt containing a structure of a cationic part of formula (c1) , and a structure of an anionic part of formula (c2) . The invention also discloses a thin structure obtained from said composition and a method for making said thin structure, as well as a liquid ejector head in which said thin structure is used. n EFFECT: composition reduces variability and provides excellent reproducibility of a three-dimensional shape when using a photolithographic process. n 11 cl, 5 dwg, 1 tbl, 12 ex |
| priorityDate |
2010-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |