http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2499079-C2

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filingDate 2009-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72d51217a46a795c52436ae5ec7ecc8b
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publicationDate 2013-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber RU-2499079-C2
titleOfInvention Production method of transparent current-conducting coating from metal oxide by means of pulse highly-ionising magnetron sputtering
abstract FIELD: metallurgy. n SUBSTANCE: transparent current-conducting coating from metal oxide is applied onto a substrate by sputtering at least of one coating component from metal oxide by applying a pulse magnetron method and its condensation on the substrate. Peak density of pulse strength of the magnetron comprises over 1.5 kW/cm 2 ; duration of the magnetron pulses is ≤200 mcs, and average increase of density of the flowing current at plasma ignition at time interval of 0.025 ms is at least 106 A/(ms·cm 2 ). n EFFECT: method allows obtaining optimum properties of the coating from metal oxide, and namely in relation to mechanical and chemical resistance, strength and optic device. n 14 cl, 2 dwg
priorityDate 2008-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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