http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2458378-C2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c40bcefec57b628e1b6729c539ad5e3a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-582 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-7034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b280b1b90289511c54003114ce3cdfaf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0944b92f6707c3aba40ef0879ec56e1f |
| publicationDate | 2012-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2458378-C2 |
| titleOfInvention | Recycling of large-size photomask substrate |
| abstract | FIELD: physics. n SUBSTANCE: method comprises the following steps for (i) removing the pattern light-shielding film from the used large-size substrate of the photomask to provide a large-size photomask-forming glass substrate stock, which must be regenerated, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to obtain a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to obtain a regenerated large-size photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to desired exposure of the mother glass, thereby obtaining a regenerated photomask substrate. n EFFECT: improved accuracy of exposure, especially accuracy and resolution of alignment. n 6 cl, 4 dwg |
| priorityDate | 2006-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.