http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2364574-C2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_18be93e8c7db0509fadfb4eb2134cc2a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-006 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 |
| filingDate | 2005-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87e2ffd80b18580f0ecc499788dc17f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6e41f215155c3922eb881f76596818f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2948dd5bb21516ed303da9e744335757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d775b66e57b5a3dab595f1c8ebc2d86c |
| publicationDate | 2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2364574-C2 |
| titleOfInvention | Method for cleaning of substrate |
| abstract | FIELD: technological processes. ^ SUBSTANCE: invention is related to method for cleaning of substrate and application of coats on it. Method for production of coat on glass substrate includes process of continuous vacuum cleaning of substrate, which consists of the following operations: substance is selected with low spraying efficiency and chemically active to contaminants; using at least one linear source of ions that generates collimated bundle of ions, plasma is generated from gas mixture that mainly contains this substance with low spraying efficiency, in particular based on oxygen; at least one part of specified substrate surface not necessarily connected to layer is exposed to action of mentioned plasma so that mentioned ionising substance removes at least partially as a result of chemical reaction contaminants that may possibly be absorbed or are available on specified part of surface. After vacuum cleaning of substrate it is necessary, without vacuum interruption, to execute at least one phase of vacuum deposition of at least one thin layer on at least one part of mentioned substrate surface. ^ EFFECT: provision of efficient cleaning of substrate. ^ 32 cl, 1 dwg |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2649695-C1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2759407-C2 |
| priorityDate | 2004-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.