http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2295170-C2

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_10efc646a4dd605c2f09c493718f5b81
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-44
filingDate 2005-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad28efd66edd255a50393bef697ab223
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publicationDate 2007-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber RU-2295170-C2
titleOfInvention Proximate analysis method for solid-state specimens using photoelectronic spectrometers
abstract FIELD: instrumentation engineering; photoelectronic spectrometers for mechanical engineering. n SUBSTANCE: proposed method that can be used for monitoring various processes by means of proximate analysis of industrial-product surface layers includes following operations: air evacuation from working chamber at pressure of 10 -6 to 10 -9 torr; cleaning of specimen surface for 0.01 to 0.1 s; specimen irradiation by ionized pulses by end of its cleaning; separation of photoelectron pulses in energy analyzer; their recording by detector; and spectrum processing. According to first alternative, working chamber is formed by surface of specimen being analyzed and sucker-type device mounted thereon. According to second alternative, specimen being analyzed is secured on substrate without destroying it and working chamber is formed by surface of this substrate and sucker-type device disposed thereon. n EFFECT: reduced proximate analysis time due to dispensing with mechanical treatment of specimen, heating and air evacuation from working chamber. n 6 cl
priorityDate 2005-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 18.