| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8da43e098b9281c7b40a1f233b25238b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D495-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D413-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-10 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F4-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L45-00 |
| filingDate |
1997-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85b52ce44c6252c731b5bbaa01a7f15c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45dcea9c78d52f5baa56d0071e62f6f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42169ea11ae06535933d65f13a4e3dd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_995caeb1a5cf89f7640cf8c47a0b7eca |
| publicationDate |
2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
RU-2194295-C2 |
| titleOfInvention |
Photoresist composition and polymer |
| abstract |
FIELD: radiation-sensitive photoresist compositions. SUBSTANCE: photoresist composition includes photoinitiator generating acid, solvent, solving inhibitor (not necessary) and polymer containing repeating polycyclic units carrying acidic-labile groups with molecular mass from 500 to approximately 1000000 which is product of polymerization of polycyclic monomers substituted by at least one acidic-labile group and not necessarily in combination with monomer selected from group including maleic anhydride, carbon monoxide, polycyclic monomer substituted by carboxyl group, alkyl-replaced polycyclic monomer and their mixtures. Acidic photoinitiator generates acid when exposed to radiation from source forming image which decomposes side acidic-labile groups and leads to change of polarity of polymer. Polymer acquires solubility in aqueous solution of base in points exposed to radiation from source forming image. EFFECT: compatibility with general scheme of chemical amplification and transparency to short- wave radiation forming image. 35 cl, 2 tbl |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016086236-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2461855-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2609105-C1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2584204-C2 |
| priorityDate |
1996-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |