http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2129321-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fee709d35bf542ab4cb822a9194a531d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate | 1994-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1999-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_114e31d6f1b1776a72b18d2547bba3b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f99cfe9ae71f4ed210118fcea2326e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67e89fe8f7048b242654e03759f2d03e |
| publicationDate | 1999-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2129321-C1 |
| titleOfInvention | Boron-containing film production process |
| abstract | FIELD: manufacture of boron-containing films. SUBSTANCE: process is conducted in liquid phase incorporating homogeneous mixture of silicon tetrachloride (SiCl 4 ) doped with nitrogen oxide and boron tetrachloride at temperatures of 50 to 200 C, proportion of ingredients being as follows, volume percent: SiCl 4 - 16-17; O 2 - 16-17; BCl 3 - 1.2-2.5; NO - the rest. EFFECT: improved quality of film. |
| priorityDate | 1994-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.