http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2071944-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03e69184adf9c7462024d78fdf325446 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F103-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 |
| filingDate | 1991-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1997-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ee2b3fb98fd8a2564fd8d1df56b78a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_240749316fa77346cd52d42993dc1f41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f49a89cd7e7844e998b4073a1bd36d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f394899624da85c169c5885c81dcc011 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9095d49bd15e798e13c163348190093d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f96abb21ef9767fbbebabf24921d13a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3784a307a526523d9c639c3a01f238be |
| publicationDate | 1997-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2071944-C1 |
| titleOfInvention | Reaction chamber |
| abstract | FIELD: sewage water cleaning equipment, may be used as electron accelerator ionizing radiation source. SUBSTANCE: reaction chamber has housing, vertical walls dividing housing into accumulating, electron radiation, treated water discharge and air delivery sections, perforated horizontal diaphragm mounted on walls, overflow walls mounted on diaphragm and transverse vertical reflectors positioned in electron radiation section. Overflow walls are shaped as rectangular trapezium of height equal to width of electron radiation sector. Smaller base of trapezium is equal to height of foam layer. Overflow walls are mounted so that their smaller base is oriented to electron radiation sector side wall to which proximal transverse vertical reflector it attached. Overflow walls and transverse reflectors are manufactured from dielectric material. EFFECT: increased efficiency, wider operational capabilities and enhanced reliability in operation. 5 dwg |
| priorityDate | 1991-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635 |
Total number of triples: 21.