| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_18947e13e036fe651f2df5d671487a8b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S507-932 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C323-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C321-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K8-532 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E21B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C319-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C313-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E21B43-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C323-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K8-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L71-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C321-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C321-14 |
| filingDate |
1988-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1995-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4717c1139d3dbb086a5ae83b5d6ad367
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16f0165bfd286fa59c9ddb4807a544d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb4214b7140301288467f701249f35f8 |
| publicationDate |
1995-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
RU-2034635-C1 |
| titleOfInvention |
Composition for removal and preventing of sulfuric deposition in gas wells and gas production equipment |
| abstract |
FIELD: gas production equipment. SUBSTANCE: composition contains compound with formula of , where R 1 and R 2 and C 1 -C 4 are alkyl radicals, a is average number of sulfur inner atoms within the range of 0-1.5, and dimethylaminoethanol or dimethylamino-2-propanol or diethylamine or triethylamine in an amount of 0-1.5 parts by weight of composition. Composition further contains polyalkene oxiamine or polyalkene oxipolyamine in an amount of 0.1-1.5 parts by weight. Composition may further contain hydrogen sulfide or alkyl mercaptan in an amount of 0.1-1.5 % by weight. Composition is used by mixing components and supplying into well, pipe or other gas production equipment, where immense sulfuric deposits may be formed. Usage of composition allows sulfur solution efficiency to be increased by 2-15 times as compared with known compositions. EFFECT: increased efficiency in solving sulfuric depositions. 4 tbl |
| priorityDate |
1987-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |