http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2021395-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2afb14c10f4596b40693bab49f270c29 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-10 |
| filingDate | 1991-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1994-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6633e0daeae5980a1c0b3dbd7291e8b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ed82ecea085d668ac52b14ad19698a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53ac5ec191c913cfd2d50cfe118c81bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9459868c31fc26c78e217a7e192d7c04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3db851fe2f9139d9f8a6632da52cc1d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ccb84bb39b00871c6595eb87dd0ea09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80bf449bb86bc857f8d7dfb27e7289fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2fa075455b5e6df669581737e6ffdf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_159d52ecdb4b7bcfe413e3b7d0f07850 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_676e2c5452a795fa2218e49d0397cf93 |
| publicationDate | 1994-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2021395-C1 |
| titleOfInvention | Method for manufacturing female dies for galvanoplastic molding of products having salient surfaces |
| abstract | FIELD: electronic engineering. SUBSTANCE: essence of this method resides in successively applying to metal base layer two coats of photopolymerizing compositions (in order of succession) including 1.00 part by mass butylmethacrylate-methacrylic acid copolymer containing 23 % methacrylic acid, 0.6 to 0.8 parts by mass oligoetheracrylate, 0.015 to 0.025 parts by mass phenanthrenequinone, 0.008 to 0.012 parts by mass crystalline violet dye, 1.00 part by mass butylmethacrylate-methacrylic acid copolymer containing 23 % methacrylic acid, 1.0 to 1.2 parts by mass oligoetheracrylate, 0.15 to 0.25 parts by mass iso-butyl ether of gum benzoin, 0.0013 to 0.0017 parts by mass 3,5-di-tret-butylbenzoquinone-1,2, and 0.008 to 0.012 parts by mass rhodamine. Disclosed method prescribes conducting exposure to light in two phases, first, exposing lower coat to light having wavelength of 400 to 450 nm via patterned phototemplet and then exposing upper coat to light having wavelength of 320 to 450 nm using patterned phototemplet and finally simultaneously developing both coats of photoresist material. EFFECT: more sophisticated technique. 3 dwg, 1 tbl |
| priorityDate | 1991-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.