abstract |
The transport and processing installation comprises a lower block containing at least supply channels for gaseous medium for wafer transfer under floating condition. A lower chamber block is located in the chamber in the lower block. A cap covers the chamber above the lower block. At least one displacer provides for downward displacement of the cap from its wafer transfer position toward at least near the block and in return. A device transfers a wafer toward and from an at least almost centric position in between the cap and the lower chamber block. A recessed upper block lies around the cap. The upper block is connected to the lower block. A tunnel passage in between the blocks provides for wafer transfer toward and from the chamber. |