| abstract |
Method of manufacturing a membrane assembly for EUV lithography. The method comprises providing a stack. The stack comprises a planar substrate. The planar substrate comprises an inner region and a border region around the inner region, at least one membrane layer, an oxide layer between the planar substrate and the at least one membrane layer, and at least one further layer between the planar substrate and the at least one membrane layer. The method further comprises selectively removing the inner region of the planar substrate, such that the membrane assembly comprises: a membrane formed at least from the at least one membrane layer, and a border holding the at least one membrane layer. The border comprises at least a portion of the planar substrate, the at least one further layer, and the oxide layer situated between the border and the at least one membrane layer. |