http://rdf.ncbi.nlm.nih.gov/pubchem/patent/NL-2007741-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d4c86e27dacbae07234cec1a12ef584 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-008 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-08 |
| filingDate | 2011-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45b94f63a35db574a65a8cc1e65978e8 |
| publicationDate | 2012-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | NL-2007741-A |
| titleOfInvention | Method and arrangement for the stabilization of the source location of the generation of extreme ultraviolet (euv) radiation based on a discharge plasma. |
| priorityDate | 2010-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.