| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D493-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1999-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2b9a7b2afbe45b672fa41b3cbd430c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e061a78336c37d5ceb9edbf2650de122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60f3e37e1e64aefd4e02721005c010c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf90fc148d51b000194789d366cd969d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee40ce68d3315e15ea938c010246647b |
| publicationDate |
2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
NL-1012916-C2 |
| titleOfInvention |
New photoresist monomer with hydroxy group and carboxyl group, copolymer thereof and photoresist composition in which this is used. |
| priorityDate |
1998-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |