http://rdf.ncbi.nlm.nih.gov/pubchem/patent/MY-187546-A

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filingDate 2018-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1af153645c4d22638953bc984bc6c49
publicationDate 2021-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber MY-187546-A
titleOfInvention Polishing composition for magnetic disk substrate
abstract Provided is a polishing composition for a magnetic disk substrate for achieving not only reduction in waviness of a substrate but also reduction in halation after polishing without decreasing productivity. The polishing composition for a magnetic disk substrate contains colloidal silica, a water-soluble polymer, and water. The water-soluble polymer compound is a copolymer containing a monomer having a carboxylic acid group, a monomer having an amide group, and a monomer having a sulfonic acid group as essential monomers. The water-soluble polymer compound has a weight average molecular weight of 1,000 to 1,000,000.
priorityDate 2017-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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