| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-31 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38 |
| filingDate |
2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_882891e8ccd5e2217a2e9ea39a7c972b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2afbc717c45fff5a9a07f1535045d3c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec3a7747c64e013fc74e4210be4b8b15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4dfc944363e71c426a34fc439b529fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d863833af08a275a28090ac89b1ea30 |
| publicationDate |
2016-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
MY-157214-A |
| titleOfInvention |
Composition for metal plating comprising suppressing agent for void free submicron feature filling |
| abstract |
A COMPOSITION COMPRISING A SOURCE OF METAL IONS AND AT LEAST ONE SUPPRESSING AGENT OBTAINABLE BY REACTING A) AN AMINE COMPOUND COMPRISING ACTIVE AMINO FUNCTIONAL GROUPS WITH B) A MIXTURE OF ETHYLENE OXIDE AND AT LEAST ONE COMPOUND SELECTED FROM C3 AND C4 ALKYLENE OXIDES, SAID SUPPRESSING AGENT HAVING A MOLECULAR WEIGHT M OF 6000 G/MOL OR MORE. (FIG. 6B) |
| priorityDate |
2009-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |