abstract |
DISCLOSED IS A POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATES, WHICH IS CHARACTERIZED BY CONTAINING A COLLOIDAL SOLUTION OF A COLLOIDAL SILICA OR THE LIKE HAVING A COLLOID CONCENTRATION OF 20-50% BY MASS, AND A POLYCARBOXYLIC ACID POLYMER, AN ACIDIC AMINO ACID, A PHENOL OR A GLYCOSAMINOGLYCAN. |