| abstract |
THERE ARE PROVIDED A POLYMER USED IN A CHEMICALLY AMPLIFIED RESIST AND REPRESENTED BY THE FOLLOWING FORMULA: WHEREIN R1, R3 AND R5 ARE SELECTED FROM THE GROUP CONSISTING OF -H AND -CH3, RESPECTIVELY, R2 IS SELECTED FROM THE GROUP CONSISTING OF T-BUTYL, TETRAHYDROPYRANYL AND 1-ALKOXYETHYL GROUPS, R4 IS SELECTED FROM THE GROUP CONSISTING OF -H AND -CH3, T-BUTYL, TETRAHYDROPYRANYL AND 1-ALKOXYETHYL GROUPS, X IS AN INTEGER OF 1 TO 4, L/(L+M+N)=0.1 TO 0.5, M/(L+M+N)=0.01 TO 0.5, AND (L+M)/(L+M+N) IS 0.1 TO 0.7, AND A RESIST COMPOSITION CONTAINING THE POLYMER. |