Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ddadb999be4f451dfc44d8e359d8f6a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2200-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2200-1037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2220-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2200-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T50-60 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0018 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q1-04 |
filingDate |
2003-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1b8d010cd786f71dd9a8a925b519382 |
publicationDate |
2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
MX-PA04007992-A |
titleOfInvention |
METHODS TO PRODUCE STRUCTURES OF PARALLEL FLATS SILICON SUBOXIDE, SILICON DIOXIDE AND / OR SILICON CARBIDE, STRUCTURE OF PARALLEL FLATS OBTAINABLE BY THESE METHODS, AND THE USE OF THE SAME. |
abstract |
A method produced by a PVD method is described, which consists of thin parallel flat face structures having a thickness in the range of 20 to 2000 nm and small dimensions in the range of less than one mm. Production is carried out. by condensing silicon suboxide on a carrier that passes through the evaporators. The carrier is precoated, before condensation of the silicon suboxide, with an inorganic or organic separating agent soluble in a PVD method. All steps, including the release of the product by dissolution, can be carried out continuously and simultaneously in different places. As a final step, SiOy can be oxidized to SiO2 in a gas that contains oxygen at atmospheric pressure and temperatures of more than 200¦C or SiOy can be converted to SiC on the surface of parallel flat-sided structures in a gas that Contains carbon from 500¦C to 1500¦C. Products produced in this way are distinguished by high uniformity of thickness. |
priorityDate |
2002-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |