http://rdf.ncbi.nlm.nih.gov/pubchem/patent/MX-2018003451-A

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filingDate 2016-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2beca85b20dda89b3ffa34926cf7e614
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publicationDate 2018-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber MX-2018003451-A
titleOfInvention POLYMER SUBSTRATE WITH HARD COVER COAT AND MANUFACTURING METHOD FOR THE SAME.
abstract The present invention relates to a polymeric substrate with the hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance. A polymeric substrate is provided with the hard coating layer comprising a polymeric substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70.80) on the surface thereof. Here, in this polymeric substrate with the hard coating layer, the hard coating layer (70.80) is laminated on the surface of the polymeric substrate, contains as a main component thereof a hydrolysis condensation product of an organic silicon compound, has a thickness of 0.1 µm to 20 µm, making direct contact with a cured bottom layer on the opposite side of the polymeric substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all the following requirements (a) a (c): (a) the film thickness of the silicon oxide layer is within the range of 3.5 µm to 9.0 µm, (b) the maximum indentation depth of the surface of the silicon oxide layer as determined by measuring nanoindentation under conditions of a maximum load of 1 mN is 150 nm or less, and (c) the limit compression ratio K of the silicon oxide layer is at most 0.975 in a fle test 3-point xion of the polymeric substrate with a hard coating layer that has undergone indentation deformation that causes the surface on which the silicon oxide layer is coated to be indented.
priorityDate 2015-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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