Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31f87c170ea6e478544c388bd11bb684 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-067 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M2200-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M2200-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2201-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M2200-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2451-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M11-79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M14-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M23-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M10-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M15-277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M10-025 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 |
filingDate |
2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f54cd45e28def82daa1f7dc19b617262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c94f10d65abd4296ae79e3a1bb030eee |
publicationDate |
2011-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
MX-2011005535-A |
titleOfInvention |
HIGH REPELLENCY MATERIALS THROUGH NANOTOPOGRAPHY AND AFTER TREATMENT. |
abstract |
A method for making a high repellency material is provided. In one embodiment the method includes the steps of providing a polymeric material having an external surface including a particle type nanotopography, the stripping of the external surface with a high energy treatment; and the deposition of the fluorochemical on the external surface pickled by a plasma fluorination process. |
priorityDate |
2008-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |