http://rdf.ncbi.nlm.nih.gov/pubchem/patent/LV-15646-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2695564f47edc986afd0c77ab8337235 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0259 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02658 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0042 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
| filingDate | 2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79c33308d5c1c4dd8422aa47e7070f1a |
| publicationDate | 2022-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | LV-15646-A |
| titleOfInvention | Yttrium Monoxide Film Deposition Technique and Yttrium Monoxide Coating |
| abstract | The invention relates to nanocoatings, in particular to nanocoatings deposited by plasma vacuum technologies and having semiconducting properties. The proposed technique for depositing a yttrium monoxide (YO) layer on a substrate using reactive magnetron sputtering involves the following steps: (i) placing the substrate in a vacuum chamber , comprising a magnetron with an yttrium source for sputtering particles, a process gas input means for partially covering the magnetron, and a substrate, the surface of which faces the source; (ii) operating the magnetron to sputter yttrium particles from the yttrium source and coat the substrate surface, including introducing process gases into the chamber; (iii) venting the gases from the vacuum chamber and creating a process pressure of 1x10-3 to 5x10-3 Torr while admitting the process gases and continuing to sputter the yttrium particles from the yttrium source; as soon as the desired coating thickness is reached on the substrate surface, the magnetron is switched off. According to a preferred embodiment of the method, sputtering of yttrium particles from the yttrium source in step (ii) is performed at a temperature of 290 to 630 K. According to another embodiment of the technique, the substrate is positioned in step (i) so that its surface facing the source is at an angle of 30-70° to the magnetron and the yttrium source. Also provided is a novel coating structure comprising a substrate and a yttrium monoxide (YO) coating layer deposited on the substrate, wherein the thickness of the yttrium monoxide coating layer is between 297 and 448 nm, and further, the substrate is selected from the group consisting of glass, polymer and metal. |
| priorityDate | 2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.