http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970076092-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
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filingDate 1997-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1997-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-970076092-A
titleOfInvention Photosensitive composition, pattern formation method and manufacturing method of electronic component
abstract The photosensitive composition containing the polysilane which has a repeating unit represented by following General formula (1) of this invention, and the benzophenone type compound which has an organic peroxide.n n n n n n n n In the formula, Ar represents a substituted or unsubstituted aryl group.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100669143-B1
priorityDate 1996-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 22.