Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 |
filingDate |
1997-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
1997-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-970071140-A |
titleOfInvention |
UV curable compositions and methods of forming cured product patterns therefrom |
abstract |
The present invention reacts with silicon-oxygen by reaction with a hydroxy group under the influence of N-substituted 4- (o-nitrophenyl) dihydropyridine (a) and a base, which constitute a base generating material which generates a base by the action of ultraviolet light. Silicone polymer of formula (R 2 SiO 2/2 ) (RSiO 2/2 ) containing a silicon-hydrogen bond (Si-H) capable of forming a bond (Si—O) and a hydrogen molecule (H 2 ) It relates to a curable composition comprising a). The composition is cured by irradiation of ultraviolet light. The pattern is formed by placing a mask between the coating film of the composition and the ultraviolet light source during irradiation, dissolving the uncured portion of the composition in a solvent, and then irradiating and removing it. |
priorityDate |
1996-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |