http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970052484-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1995-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1997-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-970052484-A |
| titleOfInvention | Pretreatment method for improving film quality of aluminum film |
| abstract | A pretreatment process for improving the film quality of an aluminum film is described. This includes loading the semiconductor substrate on which the barrier metal layer is formed into the cleaning chamber, removing the natural oxide film on the barrier metal layer by flowing chloro fluorine, and forming an aluminum film on the barrier metal layer from which the natural oxide film has been removed by chemical vapor deposition. Characterized in that. Therefore, the film quality of the chemical vapor deposited aluminum film can be improved. |
| priorityDate | 1995-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 15.