http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970023764-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1995-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1997-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-970023764-A |
| titleOfInvention | Frequency Conversion Etchers |
| abstract | The present invention relates to a frequency conversion etching apparatus that converts and etches a frequency using a variable RF generator, and converts a frequency using a variable radio frequency generator to a conventional DC bias source. The detector uses an end-point detector and a controller.n n n That is, by using a variable frequency power supply of a plasma etching apparatus, a high frequency may be selected to increase the etching selectivity, and a low frequency may be selected to reduce the etching selectivity. As in the case of DC Bias Source, there is an advantage that the disadvantages in terms of cost and size can be greatly compensated compared to attaching a generator separately according to each required frequency. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100430583-B1 |
| priorityDate | 1995-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 |
Total number of triples: 15.