http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970018100-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76846 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76882 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 |
| filingDate | 1995-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1997-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-970018100-A |
| titleOfInvention | Contact hole filling method |
| abstract | The present invention relates to a method of filling a contact hole, comprising forming an oxide film exposing a diffusion region of a conductive wire or a semiconductor substrate by a contact hole, and sequentially forming a barrier metal layer and a wet layer in an upper portion of the oxide film and inside a contact hole. After forming a conductive metal layer on the wet layer by CVD, cleaning and etching in a plasma state to remove impurities and oxides on the surface of the conductive metal layer, the temperature of about 300 ~ 500 ℃ in the reactor to perform the cleaning etching The conductive metal layer is reflowed to fill the voids to fill the contact holes. Therefore, the mobility of atoms on the surface of the conductive metal layer can be improved to allow reflow at low temperatures, thereby reducing the occurrence of spikes on the PN junction surface, and the improved mobility of atoms on the surface of the conductive metal layer creates an island. This can prevent the wires from being broken. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100640162-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100400248-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100325704-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7694385-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100411144-B1 |
| priorityDate | 1995-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.