http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970016836-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
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filingDate 1996-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1997-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-970016836-A
titleOfInvention Photoresist Stripper Composition and Photoresist Stripping Method Using the Same
abstract The present invention relates to (a) 2 to 30% by weight of hydroxylamines (b) 2 to 35% by weight of water (c) 2 to 20% by weight of amines having an acid dissociation constant (PKa) of 7.5 to 13 in an aqueous solution at 25 ° C. A peeling liquid composition for photoresists leading to 35 to 80% by weight of a water-soluble organic solvent and 2 to 20% by weight of an anticorrosive agent and a photoresist stripping method using the same.n n n Advantageous Effects of Invention The present invention is excellent in peelability of a deteriorated film formed by wet etching, ashing, ion implantation, and the like under more severe conditions, and is effective in preventing corrosion of both a substrate on which Al or an Al alloy is formed or a substrate on which Ti is formed. It is provided to the peeling liquid composition for resist excellent in the photoresist, and the photoresist peeling method using the same.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100842072-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100398996-B1
priorityDate 1995-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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