| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1996-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1996-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-960038480-A |
| titleOfInvention |
The chemically amplified positive resist composition |
| abstract |
A chemically amplified positive resist composition comprising a terminal silanol group protected with a trimethylsilyl group, a photoacid generator, and a specific polysiloxane optionally having a dissolution inhibitor. |
| priorityDate |
1995-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |