http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960035862-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1996-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1996-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-960035862-A |
| titleOfInvention | Dry etching method and apparatus |
| abstract | The etching characteristics at the time of etching are controlled to improve the uniformity of the etching characteristics and the control of the pattern dimension and the cross-sectional shape of the pattern is improved.n n n A dry etching method for etching a film deposited on a substrate, the method comprising the steps of: generating a plasma in a gas containing a reactive gas by applying electric power to the first electrode; performing a luminescence analysis of the plasma; mass analysis of the substance in the plasma; Measuring a plasma state during etching by at least one of measurement of a self-bias voltage and measurement of impedance of a plasma; and adjusting the state of the plasma in accordance with a change in the detected plasma state. |
| priorityDate | 1995-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 |
Total number of triples: 9.