http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960031641-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
| filingDate | 1996-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1996-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-960031641-A |
| titleOfInvention | Collimate sputtering method and apparatus therefor |
| abstract | The present invention provides a collimate sputtering method that improves the deposition rate per applied unit power and provides a bottom coating. The method includes the step of controlling the state of glow discharge in the chamber to increase the rate of sputtered particles having a certain angle and passing through the collimator. Thus, the rate of sputtered particles that can pass through the collimator can be increased. It is also possible to increase the rate of particles moving parallel to the vertical direction of the sputtered surface of the target. The sputtering surface of the target contains a crystal plane substantially perpendicular to the crystal axis having the shortest inter-atomic distance. |
| priorityDate | 1995-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.