http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960024676-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1995-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1996-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-960024676-A |
| titleOfInvention | Positive resist composition |
| abstract | The positive resist composition based on the silicone polymer contains a photoacid generator which decomposes upon exposure to radiation to generate an acid. The silicone polymer contains hydroxybenzyl units in which some OH groups have been substituted with t-butoxycarbonyl, t-butoxycarbonylmethyl, trimethylsilyl or tetrahydropyranyl groups. In a first form the photoacid generator is a particular onium salt having at least one phenyl group having a t-alkoxy, t-butoxycarbonyloxy or t-butoxycarbonylmethoxy substituent. In a second form the composition further comprises a nitrogenous compound. In a third form the composition further comprises a dissolution inhibitor in the form of a specific silicone compound. The composition is sensitive to high energy radiation and has high sensitivity and resolution. |
| priorityDate | 1994-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.