http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960001890-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15 |
| filingDate | 1995-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1996-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-960001890-A |
| titleOfInvention | Polyhydroxy Compound and Positive Resist Composition Containing the Same |
| abstract | The present invention is a polyhydroxy compound represented by the following general formula (I):n n n @ 109n n n (Wherein R represents alkyl having 6 or less carbon atoms)n n n And it provides the positive resist composition containing alkali-soluble resin, quinonediazide sulfonic acid ester, and the polyhydroxy compound of the said General formula (I), or the polyhydroxy compound represented by following structural formula (c).n n n @ 110n n n The positive resist composition of the present invention is excellent in sensitivity, resolution, gamma -value, resist stripping resistance and the like. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100572185-B1 |
| priorityDate | 1994-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.