http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-950005883-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0037 |
| filingDate | 1994-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1995-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-950005883-A |
| titleOfInvention | Liquid Radiation-curable Blends Used in Stereolithography |
| abstract | The present invention is based on at least one compound comprising radically polymerizable groups and at least one photoinitiator suitable for polymerization, and particularly relates to liquid radiation-curable formulations for use in stereolithography, the combination further comprising: In addition to the polyoxyalkylene-polysiloxane block copolymers selected from the copolymers of (II), (II) and (III), the block copolymers of the general formulas (I) and (II) are additionally included. :n n n (I): R 1- (OC c H 2c ) d -{[T]-(OC c H 2c ) d-1- (C c H 2c )} g -OR 1 ,n n n n n n n n In the above formula,n n n R 1 is a hydrogen atom and a C 1 -C 8 alkyl group;n n n R 1 is a methyl or phenyl group;n n n [T] is a terminated polysiloxane group [PS] as described in detail herein;n n n [PS] is a general formula Is a group of;n n n [Alk] is an alkylene group having 3 to 10 carbon atoms.n n n Cured formulations have particularly excellent impact strength. |
| priorityDate | 1993-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 46.