http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-940016539-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 1992-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1994-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-940016539-A |
| titleOfInvention | How to remove residue from reverse slope |
| abstract | The present invention provides a method for removing the residue in the reverse slope step in which the upper thin film (2) is deposited on the lower thin film (1), wherein the first protective film (3) is deposited on the upper thin film (2). 4) A first step of forming a pattern on the first passivation layer (3), the first passivation layer (3) and the upper thin film (2) exposed after the first step is sequentially etched to remove the first residual passivation layer (3 '). ) And an upper thin film 2 'and a second step of depositing the second passivation layer 6, and after the second step, dry etching the second passivation layer 6 present in the reverse slope region to dry-etch the second remaining passivation layer. A third step of forming 6 'and a fourth step of removing the remaining upper thin film 2' remaining in a reverse slope area by isotropic wet etching the residual upper thin film 2 'after the third step. And a fifth step of removing the second residual nitride film 6 'after the fourth step. It relates to the residual of the inverse gradient step of the removal method. |
| priorityDate | 1992-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 12.