http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-940014322-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-16 |
| filingDate | 1993-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1994-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-940014322-A |
| titleOfInvention | N, N-disubstituted sulfonamides and radiation sensitive mixtures prepared therefrom |
| abstract | The present invention relates to the general formula R 1 [-N (CO-OR 2 ) -SO 2 -R 3 ] n (I) and R 1 [-SO 2 -N (CO-OR 2 ) -R 3 ] n (II) N, N-disubstituted silfonamides wherein R 1 is (C 1 -C 20 ) alkyl, (C 3 -C 10 ) cycloalkyl, (C 6 -C 14 ) aryl or (n when n is 1) a C 7 -C 20) aralkyl radical, n> 1 in the case, (C 1 -C 20) alkane or (C 5 -C 7) cyclo alkane, unsubstituted or condensed condensed ilhaek or polynuclear (C 6 -C 18 ) Is a 2-, 3- or tetravalent radical of an aromatic compound, R 2 is (C 3 -C 11 ) alkyl, (C 3 -C 11 ) alkenyl or (C 7 -C 11 ) aralkyl radical, R 3 is unsubstituted or substituted (C 1 -C 6 ) alkyl, (C 3 -C 6 ) cycloalkyl, (C 6 -C 14 ) aryl or (C 7 -C 20 ) aralkyl radical] . The present invention also provides an acid-decomposable compound (b) having a higher solubility than that of the starting compound in compound (a) and an aqueous alkaline developer, which form an acid under the influence of actinic radiation, wherein compound (b) is represented by the general formula ( Aqueous alkali solution, which is insoluble in water of I) or (II)) and in water, but which is soluble or at least swellable, relates to a positive radiation sensitive mixture. The mixtures according to the invention are particularly suitable for producing offset printing plates and photoresists. |
| priorityDate | 1992-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.