http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-940009260-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 |
| filingDate | 1993-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1994-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-940009260-A |
| titleOfInvention | Radiation-sensitive resin composition for microlenses |
| abstract | (Configuration) (a) Alkyl-group-soluble resin, (b) 1,2-quinonediazide compound, (c) A compound containing 2 or more epoxy groups in a molecule, (d) Melamines, and (e) Trihalomethyl tria Radiation sensitive resin composition for microlenses containing a true stream or an onium salt.n n n (Effect) It shows excellent performance of high sensitivity, high resolution, and high residual film ratio when forming a lens pattern, and also has low dependence on heating conditions when creating a microlens, and furthermore, the obtained microlens has a high refractive index and heat deformation resistance of a submicron order. Excellent solvent resistance, transparency and adhesion to the base. |
| priorityDate | 1992-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.