http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-930018325-A
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1993-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1993-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-930018325-A |
titleOfInvention | Positive resist composition |
abstract | Alkali-soluble Novolak Resin, Quinondazide Compound and General Formula (I)n n n n n n n n (Wherein, Y 1 to Y 10 each represent a hydrogen atom, a hydroxyl group or an alkali group, at least one of which represents a hydroxyl group, and X representsn n n n n n n n (R 1 to R 3 each independently represent a hydrogen atom or an alkyl group); A positive resist composition comprising a pattern area measured by GPC of a component having a polystyrene reduced molecular weight of 1,000 or less in the alkali-soluble novolak resin, which is 25% or less of the total pattern area of the unreacted phenols.n n n The positive type resist composition of this invention is excellent in the balance of manufacturing performance, such as a sensitivity, a resolution, heat resistance, and adhesiveness. |
priorityDate | 1992-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.