http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-930013036-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-185 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-18 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00 |
| filingDate | 1992-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1993-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-930013036-A |
| titleOfInvention | Vapor phase manufacturing method of chemisorption membrane |
| abstract | The present invention provides chemical vapor deposition of chemical adsorption membranes for the purpose of uniformly adhering ultra-thin adsorption membranes having excellent water and oil repellency, fouling resistance, and the like by performing compound adsorption in a gaseous atmosphere on a substrate surface having or giving an active hydrogen group. The present invention relates to a manufacturing method, wherein the surface of a substrate having or provided with an active carboxyl group such as a hydroxyl group or an imino group is subjected to gaseous phase chemical adsorption in an atmosphere containing at least a crorosyl silane-based surfactant, without being limited to the substrate and for a short time. A chemical adsorption film is formed on the surface of the substrate. First, an adsorbent film of a siloxane monomolecular film or a polysiloxane film is formed in an atmosphere containing at least a chlorosilane compound on the surface of the substrate, and chemical adsorption is performed in an atmosphere containing at least a crorosilane-based surfactant. And also characterized in that to form a chemisorption monomolecular film or polymer film on the surface of the substrate in a short time. |
| priorityDate | 1991-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.