http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220147525-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7443f9fa412762a1a5ba8390a27fc5e3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-5456 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2022-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95843c43ce40f7de4d8f686832d702fd |
| publicationDate | 2022-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20220147525-A |
| titleOfInvention | Polishing composition and method of polishing a substrate having enhanced defect inhibition |
| abstract | The aqueous alkaline chemical mechanical polishing composition comprises a quaternary phosphonium compound having an aromatic group, which enables improved defect reduction to silicon oxide substrates and enables good silicon oxide removal rates during chemical mechanical polishing. The chemical mechanical polishing composition is stable. |
| priorityDate | 2021-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.