| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b0a3dbf8d6c9712d86ea1383fd5327 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C319-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C323-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C319-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C323-12 |
| filingDate |
2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7346cffc4905d9de12ef0bacc5d5668e |
| publicationDate |
2022-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20220113671-A |
| titleOfInvention |
Dithiapolyetherdiol, its manufacturing method, SnAg plating solution containing dithiapolyetherdiol, and method for forming a plating film using SnAg plating solution |
| abstract |
This dithiapolyetherdiol has a halogen content of less than 10 ppm, a purity of 80% or more, and is further represented by the following general formula (1) or (2). However, in general formula (1) or (2), x and y are arbitrary natural numbers. |
| priorityDate |
2019-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |