Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1755eede76ea7e719a3e0d2843cd793 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-732 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2250-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2369-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10899 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10018 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10743 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-1077 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-365 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10568 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B17-10 |
filingDate |
2020-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f50eba076598fa5b28da956f73c197ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be189847bf539731d820a214f863da40 |
publicationDate |
2022-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20220112780-A |
titleOfInvention |
Interlayer film for laminated glass, and laminated glass |
abstract |
The interlayer film for laminated glass of the present invention contains a thermoplastic resin and has a shear storage modulus at 30°C of 1.5 MPa or less. ADVANTAGE OF THE INVENTION According to this invention, when bonding inorganic glass and organic glass and obtaining laminated glass, the interlayer film for laminated glass which can fully suppress generation|occurrence|production of curvature can be provided. |
priorityDate |
2019-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |