abstract |
A resist composition containing a resin component having a structural unit represented by the general formula (a0-1) and a photodegradable base having an acid dissociation constant of a conjugated acid of 4.0 or less is employed. In general formula (a0-1), R 01 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Ya 01 is a single bond or a divalent linking group. Ra 01 is a hydrocarbon group. Ya 02 is a single bond or a divalent linking group. Ra 02 is a hydrogen atom, a hydroxy group, or a hydrocarbon group. Ar is a benzene ring or a naphthalene ring. Ra 01 and Ra 02 are bonded to each other and are a ring with a secondary carbon atom to which Ra 01 and Ya 02 are bonded, a carbon atom of Ar to which Ya 02 and Ya 02 are bonded, and a carbon atom of Ar to which Ra 02 is bonded. may be formed. n01 is an integer of 1-6. |