| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2020-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7bd16576f9a1a6747b2fba95c797e56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acd32db7dd26aa2605483ac4f39a5258 |
| publicationDate |
2022-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20220079908-A |
| titleOfInvention |
Positive Tone Photoresist Formulation Using Crosslinkable Siloxane Compounds |
| abstract |
The present invention relates to novel positive tone photoresist formulations comprising the use of crosslinkable siloxane polymers. The siloxane polymer used in the positive tone photoresist formulation is crosslinkable and comprises a first repeating unit containing at least one maleimide group and a second repeating unit not containing a maleimide group. The present invention relates to a method for manufacturing a microelectronic structure using a positive tone photoresist formulation according to the present invention, and to an electronic device comprising a microelectronic structure obtained or obtainable by said manufacturing method. |
| priorityDate |
2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |