| abstract |
Provided are a radiation-sensitive resin composition capable of exhibiting sensitivity, CDU performance, and LWR performance at a sufficient level, and a method for forming a resist pattern. A radiation-sensitive resin composition comprising an onium salt compound represented by the following formula (1), a resin comprising a structural unit having an acid dissociable group, and a solvent. (In the formula (1), R 1 is a substituted or unsubstituted monovalent organic group having a cyclic structure or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or -NR α -. R α is hydrogen It is an atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z + is a monovalent onium cation.) |