http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220024514-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
| filingDate | 2020-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20220024514-A |
| titleOfInvention | Liquid composition for selective removal of polysilicon over P-doped silicon and silicon-germanium during fabrication of semiconductor devices |
| abstract | An etching solution suitable for the selective removal of silicon over p-doped silicon and/or silicon-germanium from microelectronic devices is described herein, said solution comprising: water; at least one of NH 4 OH or quaternary ammonium hydroxide; at least one compound selected from benzoquinone or derivatives of benzoquinone, quinoline or derivatives of quinoline, unsubstituted or substituted C 6-20 aliphatic acids, C 4-12 alkylamines and polyalkyleneimines; optionally at least one water-miscible organic solvent; and optionally at least one compound selected from alkanolamines and polyamines. |
| priorityDate | 2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 349.