| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f517051dd4d265e5e931724f45b34ddc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04 |
| filingDate |
2020-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8f522422bf444362d31b147a0f0a547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea78a9974d17726fa8608e1fff6200bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f27efe57a54f6326f5206a0df2db426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9f4c08782e906cd20f862ad2c84adf7 |
| publicationDate |
2022-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20220019587-A |
| titleOfInvention |
Etchant compositions and methods of manufacturing semiconductor device using the same |
| abstract |
The present invention relates to an etching composition and a method for manufacturing a semiconductor device using the same, wherein the etching composition includes an inorganic acid and a silane-based compound. |
| priorityDate |
2020-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |