| abstract |
An object of the present invention is to provide a method for producing an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern in which defects are suppressed. Moreover, the other subject of this invention is providing the pattern formation method using the manufacturing method of the said actinic-ray-sensitive or radiation-sensitive resin composition, and the manufacturing method of the electronic device using the said pattern formation method. The method for producing an actinic ray-sensitive or radiation-sensitive resin composition of the present invention comprises at least a resin whose polarity is increased by decomposition by the action of an acid, a compound that generates an acid by irradiation with actinic ray or radiation, and a solvent. A method for producing an actinic ray-sensitive or radiation-sensitive resin composition comprising: 1 selected from the group consisting of compound (I) to compound (III) A first solution containing a first solvent and a resin that is decomposed by the action of an acid to increase polarity and contains at least one compound, and at least one selected from the group consisting of compounds (I) to (III) This is a method for preparing an actinic ray-sensitive or radiation-sensitive resin composition by mixing the compounds. |