http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220004811-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22 |
| filingDate | 2020-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27dfa0ca43ee0cc5b135a81589333ee9 |
| publicationDate | 2022-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20220004811-A |
| titleOfInvention | Polymer and positive resist composition |
| abstract | An object of the present invention is to provide a polymer capable of forming a resist pattern in which reduction of the pattern top is suppressed when used as a main chain cleavage type positive resist. The polymer of the present invention has a monomer unit (A) represented by the following general formula (I) and a monomer unit (B) represented by the following general formula (II), and a ratio of a component having a molecular weight of 100,000 or more is 10% or more to be. In addition, in general formula (I), X is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or an astatine atom, and R< 1> is an organic group whose number of fluorine atoms is 3 or more and 7 or less. In the general formula (II), R 2 is a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or an alkyl group substituted with a fluorine atom, R 3 is a hydrogen atom, an unsubstituted alkyl group or an alkyl group substituted with a fluorine atom, p and q are , an integer greater than or equal to 0 and less than or equal to 5, and p + q = 5. |
| priorityDate | 2019-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.