| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2020-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_104de38f985f1ca57987e3bbcc20d7a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64e79da2a7f9f89c9ff4f62ae22702e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da7211b18d193ee23deca7657c335384
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_934f693749290445c95d2c2329563517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_578085a4326660138e588c5a32b3cfb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60d03228d04a1e5ad8a0406be6f82504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_993e4d89bb53f5a0a091d7963b3b7ee0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e477f2f1bf71ce96bd62960e993a4a51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d8911333c2e56626ab57d76f627b7b9 |
| publicationDate |
2021-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210151229-A |
| titleOfInvention |
Atomic Layer Etching for Subtractive Metal Etching |
| abstract |
A method of atomic layer etching a metal-containing layer is provided. At least a region of the surface of the metal-containing layer is modified to form a modified metal-containing region by exposing the surface of the metal-containing layer to a modifying gas, and an unmodified metal-containing region remains adjacent the modified metal-containing region. . The modified metal-containing regions are selectively removed relative to the unmodified metal-containing regions by exposing the surface of the metal-containing layer to an inert bombardment plasma generated from an inert gas. |
| priorityDate |
2019-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |